Is Your PFAS-Free Innovation Ready for Greater Impact?
You’ve developed a proven PFAS-free alternative. Imagine:
- Finding and securing new, highly relevant clients eager to consider your PFAS-free solution.
- Expanding into new industrial sectors and geographies, supported by expert guidance on industrial market entry.
- Connecting with senior decision-makers ready to integrate future-proof materials.
- Turning pilot trials into long-term commercial relationships, scaling faster with credibility.
- Being positioned as the trusted choice for manufacturers seeking PFAS elimination solutions.
If any of this feels familiar, our collaboration model is designed for exactly these inflection points.
Why Partner with Lotus Nano?
As your strategic adoption partner, Lotus Nano works with your team to expand the reach of your PFAS-free solution into the industries where it can have the greatest impact.
Our expertise in PFAS-free chemistry and industrial adoption and implementation helps you navigate complex markets, gain trusted entry with relevant key buyers, and achieve scalable, long-term adoption.
We Help You:
Our Performance-Based Collaboration Model
At Lotus Nano, our collaboration partners benefit from a fully de-risked approach that is 100% outcome and milestone-based, with no commercial barriers to entry.
No upfront or hidden fees. No Risk. Our compensation is tied solely to achieving mutually agreed milestones – your results drive ours.
Who We Invite to Collaborate
We collaborate where we can deliver measurable value. Our ideal partners typically:
- Offer proven, high-performance alternatives to industrial PFAS challenges.
- Demonstrate scalable readiness for market deployment.
- Have early commercial traction, pilot activity, or industry interest.
- Seek accelerated entry into new sectors or regions.
- Align with our mission to achieve measurable PFAS reduction at industrial scale.
Onboarding Availability
Effective Q1/25 we are limiting strategic collaboration onboarding to two new PFAS-free innovators per quarter.